4N Tantalum Grain [MH-XC-Ta4N]
Product Features
Introducing our high-performance Spherical Tantalum Powder, ideal for advanced manufacturing processes requiring precision and reliability:
- High Purity and Low Oxygen Content: Featuring a tantalum content of ≥99.99%, this powder is optimized for applications demanding high purity.
- High Sphericity and Smooth Surface: The powder has no satellite particles, ensuring uniform particle size distribution and excellent flowability.
- Superior Bulk and Tap Density: Achieves a high tap density of 10.12 g/cm³, which is ideal for packing in industrial applications.
Applications
Spherical tantalum powder is ideal for:
- Additive Manufacturing: Perfect for laser and electron beam additive manufacturing.
- Hot Isostatic Pressing (HIP): Ensuring structural integrity in high-pressure environments.
- Laser Cladding and Spraying: Ideal for laser cladding, thermal spraying, and cold spraying.
- Versatile Particle Sizes: Available standard powder particle sizes include 5-25μm, 15-53μm, 45-106μm, and 53-150μm.
Technical Highlights
- Granularity Range: Available in a wide range of particle sizes, from 53-150μm, providing flexibility for different production processes.
- High Flowability: A Hall flow rate of 5.0 s/50g allows for smooth processing in additive manufacturing and other advanced techniques.
Technical Specifications
| Parameter | Value |
|---|---|
| Tantalum (Ta) Content (%) | ≥99.99 |
| Manganese (Mn) Content (%) | 0.0003 |
| Titanium (Ti) Content (%) | <0.0003 |
| Aluminum (Al) Content (%) | 0.0004 |
| Iron (Fe) Content (%) | 0.0015 |
| Nickel (Ni) Content (%) | 0.0003 |
| Chromium (Cr) Content (%) | 0.0050 |
| Niobium (Nb) Content (%) | 0.0006 |
| Molybdenum (Mo) Content (%) | 0.0010 |
| Silicon (Si) Content (%) | 0.0006 |
| Granularity (μm) | 53-150 |
| Apparent Density (g/cm³) | 9.60 |
| Tap Density (g/cm³) | 10.12 |
| Hall Flow Rate (s/50g) | 5.0 |
