4N Spherical Tantalum Powder [MH-XC-Ta4N]
Product Features
Introducing our premium-quality Spherical Tantalum Powder, optimized for various advanced manufacturing processes:
- High Purity and Low Oxygen Content: Ensures superior performance with ≥99.99% tantalum, critical for high-end applications.
- High Sphericity and Smooth Surface: No satellite particles, ensuring uniformity and high flowability for efficient manufacturing.
- Excellent Bulk and Tap Density: Achieves superior packing characteristics with a tap density of 10.12 g/cm³, making it ideal for industrial use.
Applications
Spherical tantalum powder is ideal for:
- Additive Manufacturing: Perfect for laser/electron beam additive manufacturing.
- Hot Isostatic Pressing (HIP): Ensuring structural integrity in high-pressure environments.
- Laser Cladding and Spraying: Ideal for laser cladding, thermal spraying, and cold spraying.
- Versatile Particle Sizes: Available standard powder particle sizes include 5-25μm, 15-53μm, 45-106μm, and 53-150μm.
Technical Highlights
- High Flowability: A Hall flow rate of 5.0 s/50g ensures smooth processing in additive manufacturing and thermal spraying.
- Wide Particle Size Range: Available in various granularity ranges (53-150μm) for flexibility in different applications.
Technical Specifications
| Parameter | Value |
|---|---|
| Tantalum (Ta) Content (%) | ≥99.99 |
| Manganese (Mn) Content (%) | 0.0003 |
| Titanium (Ti) Content (%) | <0.0003 |
| Aluminum (Al) Content (%) | 0.0004 |
| Iron (Fe) Content (%) | 0.0015 |
| Nickel (Ni) Content (%) | 0.0003 |
| Chromium (Cr) Content (%) | 0.0050 |
| Niobium (Nb) Content (%) | 0.0006 |
| Molybdenum (Mo) Content (%) | 0.0010 |
| Silicon (Si) Content (%) | 0.0006 |
| Granularity (μm) | 53-150 |
| Apparent Density (g/cm³) | 9.60 |
| Tap Density (g/cm³) | 10.12 |
| Hall Flow Rate (s/50g) | 5.0 |
