3N5 Spherical Tantalum Powder [MH-TS-Ta3N5]
Product Features
Introducing our premium Spherical Tantalum Powder, designed to meet the demanding requirements of modern manufacturing processes:
- High Purity and Low Oxygen Content: Featuring a tantalum content of ≥99.95%, this powder is ideal for high-end applications where purity is crucial.
- Sphericity and Smooth Surface: The powder’s smooth surface and no satellite particles ensure superior flowability and uniform particle distribution.
- Excellent Density Properties: With an apparent density of ≥9.5 g/cm³ and tap density of ≥10.5 g/cm³, this powder provides optimal packing characteristics for industrial use.
Applications
Spherical tantalum powder is ideal for:
- Additive Manufacturing: Excellent for laser and electron beam additive manufacturing processes.
- Hot Isostatic Pressing (HIP): Ensures high structural integrity in high-pressure applications.
- Laser Cladding and Spraying: Suitable for laser cladding, thermal spraying, and cold spraying.
- Particle Size Options: Available powder particle sizes include 5-25μm, 15-53μm, 45-106μm, and 53-150μm, offering flexibility for different processes.
Technical Highlights
- Granularity Flexibility: Available in a particle size range of 53-150μm, providing options for various manufacturing needs.
- High Flowability: A Hall flow rate of ≤6.5 s/50g ensures smooth processing in additive manufacturing, HIP, and spraying applications.
Technical Specifications
| Parameter | Value |
|---|---|
| Tantalum (Ta) Content (%) | ≥99.95 |
| Iron (Fe) Content (%) | <0.001 |
| Silicon (Si) Content (%) | <0.005 |
| Nickel (Ni) Content (%) | <0.002 |
| Titanium (Ti) Content (%) | <0.001 |
| Molybdenum (Mo) Content (%) | <0.001 |
| Tungsten (W) Content (%) | <0.01 |
| Niobium (Nb) Content (%) | <0.01 |
| Granularity (μm) | 53-150 |
| Apparent Density (g/cm³) | ≥9.5 |
| Tap Density (g/cm³) | ≥10.5 |
| Hall Flow Rate (s/50g) | ≤6.5 |
